VAPOR DEPOSITION MASK, AND ORGANIC SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition mask capable of realizing both of high definition and light weight even when the mask is made large, easily removing slag adhered to the vapor deposition mask while restraining damage onto an opening of a resin mask, and forming a high-definition vapor deposition pattern for a long time, and an organic semiconductor element manufacturing method capable of precisely manufacturing an organic semiconductor element.SOLUTION: In a vapor deposition mask 100, a metallic mask 10 with a slit 15 is laminated on one face of a resin mask 20 provided with an opening 25 corresponding to a vapor-deposited pattern. An anti-fouling layer 40 is provided on one or both of a region corresponding to a position overlaid on the slit 15 on one face of the resin mask 20, and the other face of the resin mask.