发明名称 INSPECTION METHOD OF VAPOR DEPOSITION MASK, AND INSPECTION APPARATUS OF VAPOR DEPOSITION MASK
摘要 <p>PROBLEM TO BE SOLVED: To provide an inspection method of a vapor deposition mask which is capable of improving inspection accuracy of through-holes.SOLUTION: In an inspection method of vapor deposition mask of the present invention, a plurality of vapor deposition masks 20 are imaged, and a mask image showing the plurality of vapor deposition masks 20 is acquired first. Next, in the mask image, an inspection target region showing effective regions 22 is defined for each vapor deposition mask 20. Then, presence or absence of a defect in through-holes 25 in the effective regions 22 of the vapor deposition mask 20 shown by the inspection target region is determined. In a process of defining the inspection target region, an inspection target region corresponding to one vapor deposition mask 20 out of the plurality of vapor deposition masks 20 is defined based on a position of an alignment mark 27 of the one vapor deposition mask, and an inspection target region corresponding to another vapor deposition mask 20 is defined based on a position of an alignment mark 27 of the another vapor deposition mask 20.</p>
申请公布号 JP2015067889(A) 申请公布日期 2015.04.13
申请号 JP20130205389 申请日期 2013.09.30
申请人 DAINIPPON PRINTING CO LTD 发明人 OTA TAKAYUKI;NAMBARA KATSUHIKO;HORIUCHI MASAHIRO;TOMIKI YASUHIKO
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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