| 摘要 |
A plasma processing apparatus prevents formation of local plasma in a penetration opening of a processing container. An insulation member (45) as an impedance adjustment member is installed on an opening bottom surface of the penetration opening of the processing container. The insulation member (45) is made of a material having less than or equal to 10, desirably 4 of specific inductive capacity. The formation of local plasma can be prevented in a gate opening (41) by making an electric impedance of the penetration opening from plasma by the insulation member (45) larger than a liner (60) of a body container (2A). A cover member (47) is arranged on the insulation member (45). The insulation member (45) can be protected by plasma by covering the surface of the insulation member (45). |
