| 摘要 |
PROBLEM TO BE SOLVED: To provide a mirror polishing method and a mirror polishing device in which generation of buff burning can be avoided and in which time needed for mirror polishing becomes too long can be avoided.SOLUTION: At a polishing stand table 6, provided are a sisal hemp stand table which includes a buff roll 60 in which buff material is constituted of sisal hemp, and a rayon stand table which includes a buff roll 60 in which buff material is constituted of rayon and is arranged at the downstream side of the sisal hemp stand table along the transportation direction 4a of a metal strip 4. After the surface of the metal strip 4 is polished by the sisal hemp stand table, the surface of the metal strip 4 is mirror-polished by the rayon stand table. |
