发明名称 |
VACUUM VAPOR DEPOSITION DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent diameter reduction or clogging of a nozzle due to accumulation of a vapor deposition material onto a nozzle for emitting vapor in a vacuum vapor deposition device.SOLUTION: A crucible 7 houses a vapor deposition material 6, and a nozzle 1 for emitting vapor is formed at a tip of the crucible 7. A heater 3 for heating the crucible 7 is arranged around the crucible 7. A heat transfer member 5 for adjusting temperature distribution of the crucible 7 is arranged between the heater 3 and the crucible 7. An existing range of the heater 3 is set to a range of 1/3 or more and 2/3 or less of entire length of the crucible 7 from the nozzle 1 side.</p> |
申请公布号 |
JP2015067847(A) |
申请公布日期 |
2015.04.13 |
申请号 |
JP20130201690 |
申请日期 |
2013.09.27 |
申请人 |
HITACHI HIGH-TECH FINE SYSTEMS CORP |
发明人 |
MIYAKE TATSUYA;TAMAKOSHI TAKESHI;MINEKAWA HIDEAKI;MATSUURA HIROYASU;OGATA TOMOHIKO;KUSUNOKI TOSHIAKI |
分类号 |
C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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