发明名称 VACUUM VAPOR DEPOSITION DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent diameter reduction or clogging of a nozzle due to accumulation of a vapor deposition material onto a nozzle for emitting vapor in a vacuum vapor deposition device.SOLUTION: A crucible 7 houses a vapor deposition material 6, and a nozzle 1 for emitting vapor is formed at a tip of the crucible 7. A heater 3 for heating the crucible 7 is arranged around the crucible 7. A heat transfer member 5 for adjusting temperature distribution of the crucible 7 is arranged between the heater 3 and the crucible 7. An existing range of the heater 3 is set to a range of 1/3 or more and 2/3 or less of entire length of the crucible 7 from the nozzle 1 side.</p>
申请公布号 JP2015067847(A) 申请公布日期 2015.04.13
申请号 JP20130201690 申请日期 2013.09.27
申请人 HITACHI HIGH-TECH FINE SYSTEMS CORP 发明人 MIYAKE TATSUYA;TAMAKOSHI TAKESHI;MINEKAWA HIDEAKI;MATSUURA HIROYASU;OGATA TOMOHIKO;KUSUNOKI TOSHIAKI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
代理机构 代理人
主权项
地址