EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure device advantageous for highly accurately performing mix-and-match with an other exposure device for which a projection optical system differing in projection magnification is adopted.SOLUTION: This exposure device exposes a pattern image formed on a master onto a substrate as a first pattern formation area via a first projection optical system having a first projection magnification. A control unit controls synchronous scanning of a master holding unit and a substrate holding unit, and causes the first pattern formation area to be exposed on top of a second pattern formation area exposed in advance onto the substrate via a second projection optical system having a second projection magnification differing from the first projection magnification. Especially, the control unit causes the operation of the master holding unit or the substrate holding unit to be changed, while the first pattern formation area is collectively scanned and exposed onto a plurality of second pattern formation areas by one scanning of the master holding unit and the substrate holding unit, on the basis of the state of the second pattern formation area or the state of pattern formation on the master.