| 摘要 |
<p>Provided in the present invention is an imprint apparatus forming a pattern on a target area by forming an imprint material on the target area on a substrate by using a mold. The apparatus comprises a heater formed to transform the target area by heating the substrate; a measuring device measuring the overlapped state between the target area and the mold; and a controller formed to control the heater for the overlapped state to be in an acceptable range.</p> |
