| 摘要 |
<p>The present invention relates to a photocurable composition and a method for forming a pattern using the same, wherein the photocurable composition contains metal nanowires, a water-soluble photocurable resin, benzene carboxylic acid-based multi-functional acrylate, and a water-soluble photoinitiator, thereby having improved curability and solubility in water such that a pattern can be formed without photoresist and etching processes which generate a deterioration and loss of the base film.</p> |
