| 摘要 |
PROBLEM TO BE SOLVED: To determine with high accuracy, quality of ejection operation at a plurality of ejection ports.SOLUTION: In an ejection inspection part 5 of a substrate processing apparatus, a light emission part 51 emits planar light 510 along a predetermined light present surface to radiate the light to processing fluid ejected from a plurality of ejection ports of an ejection head 31. An imaging part 52 images the processing fluid transmitting the planar light 510 from the light emission part 51 to obtain an inspection image including a plurality of bright spots. In the ejection inspection part 5, a reference image is prestored. The reference image is an image obtained by the imaging part 52 in a state in which the processing fluid is normally ejected from the plurality of ejection ports of the ejection head 31 while the planar light 510 is emitted from the light emission part 51. By using a quality determination part, the substrate processing apparatus is capable of individually determining quality of ejection operation with high accuracy at the plurality of ejection ports respectively on the basis of a difference between the reference image and the inspection image. |
