LITHOGRAPHIC APPARATUS,申请号US201314399870-传众专利搜索

发明名称	LITHOGRAPHIC APPARATUS
摘要	A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
申请公布号	US2015098067(A1)	申请公布日期	2015.04.09
申请号	US201314399870	申请日期	2013.05.02
申请人	ASML Netherlands B.V.	发明人	Koevoets Adrianus Hendrik;Cadee Theodorus Petrus Maria;Singh Harmeet
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项	1. A lithographic apparatus, comprising a first body comprising a heat source; a second body; and a heater device; wherein the second body has a facing surface facing the first body via a gap between the first and second bodies, wherein the heat source is for providing a heat flux to the second body via the gap, wherein the heater device is attached to the facing surface, and wherein the heater device is configured to provide a further heat flux to the second body.
地址	Veldhoven NL