| 摘要 |
<p>The present invention relates to an apparatus for manufacturing semiconductor substrates more specifically, relates to an apparatus for cleaning substrates. An apparatus for cleaning substrates according to an embodiment of the present invention comprises: a first process chamber to supply and fluid treat a liquefied organic solvent to a substrate on which a pattern is formed; a transfer unit to transfer the substrate from the fluid treatment chamber; and a drying member to dry the substrate transferred, wherein the drying member includes an apparatus for cleaning substrates provided to the transfer unit.</p> |
