发明名称 POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent the occurrence of a scratch by pollution such as a polishing liquid stuck to a top ring, by efficiently cleaning a seal member for blocking up a clearance caused between a freely expandable connection sheet, a top ring body and a retainer ring with wash water, for blocking up the clearance caused inside the retainer ring vertically movably provided in an outer peripheral surface of the top ring body.SOLUTION: A polishing device comprises a polishing table having a polishing surface, a retainer ring guide 410 fixed to the top ring body 2, and a freely expandable connection sheet 420 guided by the retainer ring guide 410 and blocking up the clearance between a ring member 408 of a vertically moving retainer ring 3 and itself, and comprises a top ring for holding a substrate and pressing it to the polishing surface, and a connection sheet cleaning nozzle 500 for cleaning a connection sheet 420 by directly applying a water flow by injecting the wash water in the horizontal direction toward the connection sheet 420.
申请公布号 JP2015062956(A) 申请公布日期 2015.04.09
申请号 JP20130185884 申请日期 2013.09.09
申请人 EBARA CORP 发明人 UMEMOTO MASAO;SONE CHUICHI;AIZAWA HIDEO;KOSUGE RYUICHI
分类号 B24B55/06;B24B37/32;H01L21/304 主分类号 B24B55/06
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