| 摘要 |
PROBLEM TO BE SOLVED: To provide: a method for manufacturing a film with a pattern shape, in which alignment marks of a mold and a substrate can be highly accurately detected with a simplified method and high throughput properties are obtained; a method for manufacturing an optical component; a method for manufacturing a circuit board; and a method for manufacturing an electronic apparatus.SOLUTION: In a method for manufacturing a film with a pattern shape by optical nanoimprinting, gas satisfying the following expression (1) is used. |n-n|≤|n-n| (1) (in the expression (1), nrepresents the refractive index of a photocurable composition R at a wavelength of light (a), nrepresents the refractive index of a photocurable composition R' at a wavelength of the light (a), the gas being dissolved in the photocurable composition R', and nrepresents the refractive index of a mold at a wavelength of the light (a).) |
