| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a fine structure manufacturing method capable of manufacturing a fine structure including a transmission part having higher X-ray transmissivity than the conventional transmission parts.SOLUTION: A fine structure manufacturing method includes first to fourth steps. The first step forms a support layer 7 of a substrate in which a metal structure 4 is formed in a recess 3 formed on a first surface of a silicon substrate 1 so as to come into contact with the metal structure 4 exposed on the first surface. The second step exposes a surface facing at least a region in contact with the support layer in the metal structure 4 from the silicon substrate 1 by selectively etching the silicon substrate 1, and acquires a structure including the metal structure and the support layer 7. The third step selectively etches the support layer of the structure.</p> |
