发明名称 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device which can achieve high throughput.SOLUTION: A substrate processing device of the present embodiment comprises: a detector for detecting a failure of primary cleaning modules 201A, 201B and secondary cleaning modules 202A, 202B; and a control part 5 for selecting when the detector detects a failure of any among the primary cleaning modules and the secondary cleaning modules, a cleaning line which avoids the damaged cleaning module and performs switching to the selected cleaning line. When any of the plurality of primary cleaning modules is cleaning a substrate or is damaged, the control part 5 controls a first transfer robot 209 to transfer the substrate to the primary cleaning module of the plurality of primary cleaning modules, which is not cleaning the substrate or which is not damaged.
申请公布号 JP2015065478(A) 申请公布日期 2015.04.09
申请号 JP20140259713 申请日期 2014.12.24
申请人 EBARA CORP 发明人 KOBAYASHI KENICHI;SOTOZAKI HIROSHI;SHINOZAKI HIROYUKI;MAKINO NATSUKI;KATSUOKA SEIJI;KUNISAWA JUNJI;NABEYA OSAMU;MORISAWA SHINYA;OGAWA TAKAHIRO
分类号 H01L21/304;B24B37/34;B24B41/06 主分类号 H01L21/304
代理机构 代理人
主权项
地址