(METH)ACRYLIC ACID-BASED COPOLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, AND CURED PRODUCT OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a cured film achieving a good balance in characteristics required to a protective film or an interlayer insulating film can be formed, a pattern image can be formed with high resolution and high definition, and a favorable pattern having no development residual film can be formed.SOLUTION: A (meth)acrylic acid-based copolymer is prepared by introducing a glycidyl methacrylate into a copolymer having a carboxyl group in a side chain, in which impurities derived from glycidyl methacrylate are included by less than 1 wt.% with respect to the glycidyl methacrylate. The (meth)acrylic acid-based copolymer has unsaturated double bonds derived from the glycidyl methacrylate by 10 to 200 mol per 1 mol of the copolymer molecule, and has a number average molecular weight of 10,000 to 50,000.