发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technique capable of cooling an optical instrument mounted on a substrate processing apparatus with a simple constitution.SOLUTION: A substrate processing apparatus comprises: a housing 10; a holding part 3 holding a substrate W in an internal space of the housing 10; an air flow formation part 7 for forming an air flow in the internal space; a housing box 16 disposed in the internal space; and an optical instrument 5 which is housed in the housing box 16 and used for processing the substrate. A wall 161 on the upstream side of the air flow in the housing box 16 has a ventilation structure allowing wind to pass therethrough.
申请公布号 JP2015065264(A) 申请公布日期 2015.04.09
申请号 JP20130197837 申请日期 2013.09.25
申请人 SCREEN HOLDINGS CO LTD 发明人 NISHIKAWA TAKAYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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