发明名称 SEMICONDUCTOR-METAL-ON-INSULATOR STRUCTURES, METHODS OF FORMING SUCH STRUCTURES, AND SEMICONDUCTOR DEVICES INCLUDING SUCH STRUCTURES
摘要 Methods for fabricating semiconductor-metal-on-insulator (SMOI) structures include forming an acceptor wafer including an insulator material on a first semiconductor substrate, forming a donor wafer including a conductive material and an amorphous silicon material on a second semiconductor substrate, and bonding the amorphous silicon material of the donor wafer to the insulator material of the acceptor wafer. SMOI structures formed from such methods are also disclosed, as are semiconductor devices including such SMOI structures.
申请公布号 EP2543069(A4) 申请公布日期 2015.04.08
申请号 EP20110751050 申请日期 2011.02.10
申请人 MICRON TECHNOLOGY, INC. 发明人 TANG, SANH, D.;ZHANG, MING;BAYLESS, ANDREW, M.;ZAHURAK, JOHN, K.
分类号 H01L27/12;H01L21/20;H01L21/8247;H01L21/84;H01L27/115;H01L29/786 主分类号 H01L27/12
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