发明名称 半導体物理量センサおよびその製造方法
摘要 <p>A semiconductor physical quantity sensor includes (i) a semiconductor substrate having a first conductive type, (ii) a diaphragm portion disposed in the semiconductor substrate, (iii) a sensing portion disposed in the diaphragm portion, (iv) a well layer having a second conductive type, and (v) a back flow prevention element. The well layer is disposed in a surface portion of the semiconductor substrate, and corresponds to the diaphragm portion. The back flow prevention element is provided by a MOSFET, a JFET, a MESFET, or a HEMT. The back flow prevention element includes two second conductive diffused portions and a gate electrode. The back flow prevention element is arranged on a first electrical wiring, which provides a passage for applying a predetermined voltage to the well layer from an external circuit. The back flow prevention element turns on based on a voltage applied to the gate electrode.</p>
申请公布号 JP5696736(B2) 申请公布日期 2015.04.08
申请号 JP20130064488 申请日期 2013.03.26
申请人 发明人
分类号 G01L9/00;H01L29/84 主分类号 G01L9/00
代理机构 代理人
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