| 发明名称 |
HIGH FREQUENCY PLASMA SOURCE |
| 摘要 |
<p>A high frequency plasma source includes a support element, on which a magnetic field coil arrangement, a gas distribution system and a unit for extraction of a plasma beam are arranged. Additionally a high frequency matching network is arranged within the plasma source.</p> |
| 申请公布号 |
EP1290926(B1) |
申请公布日期 |
2015.04.08 |
| 申请号 |
EP20010913824 |
申请日期 |
2001.02.21 |
| 申请人 |
CCR GMBH BESCHICHTUNGSTECHNOLOGIE |
发明人 |
WEILER, MANFRED;DAHL, ROLAND |
| 分类号 |
H05H1/46;H01J37/32;H01L21/205;H01L21/3065 |
主分类号 |
H05H1/46 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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