| 摘要 |
<p>The present invention has the purpose of effectively preventing a pattern destruction when drying a substrate by certainly substituting washing water on the surface of a substrate with a volatile solvent, and improving productivity of such the substrate. The substrate treatment apparatus (10) of the present invention has a solvent supply part (58) additionally include a magnetic field forming means, wherein the magnetic field forming means (100) applies a magnetic field on the surface of the substrate (W) in which the washing water and the volatile solvent exist together, and the washing water and the volatile solvent on the surface of the substrate (W) are stirred and mixed to promote substitution of the washing water by the volatile solvent.</p> |
