| 摘要 |
<p>The present invention relates to a method to compensate a field of view during a substrate inspection. The method comprises: a step of determining the validity of a first field of view on a substrate; a step of determining a valid field of view (FOV) among adjacent fields of view within a predetermined radius around the first field of view (FOV) when the first field of view (FOV) has no validity; a step of extracting feature objects within the predetermined radius around the first field of view from the valid fields of view (FOV); and a step of generating a compensation matrix for the first field of view using information of the extracted feature objects. According to the method, the reliability of an inspection result during the substrate inspection can be enhanced even when the compensation matrix generated using the information of the feature objects within the first field of view has no validity.</p> |
