| 摘要 |
The present invention has the subject of providing a substrate processing method and a substrate processing apparatus which can effectively remove contaminant generated by affected by fluorine ion generated during rubbing process. A substrate processing apparatus processing rubbed substrate used in a liquid crystal display panel comprises a first process (11) cleaning the substrate by nitrogen gas-dissolved water formed by dissolving gas at least including in water, wherein the temperature of the nitrogen gas-dissolved water is adjusted in a range of 40°C or more and 80°C or less. |
