| 摘要 |
<p>The present invention is a coating and developing apparatus which is configured so that after a coated layer has been formed on a substrate in a processing block, the substrate is transferred to an exposure device, development is performed in the processing block on the post-exposure substrate, and the substrate is then transferred to a carrier and which processes a greater number of substrates in a given time than the exposure device. This coating and developing apparatus comprises the following: a temporary holding unit in which the substrate is temporarily held once before exposure; a stop time setting unit in a substrate conveyance path that sets the length of time for which the conveyance of the upstream substrates is stopped, in order to carry out maintenance on the module in which the substrate is placed; and a control unit which monitors whether the number of substrates held in the temporary holding unit has reached the number of substrates processed by the processing block in accordance with the length of the stopping time, and supplies a control signal so as to stop conveyance of the upstream substrates in the temporary holding unit after the predetermined number of processed substrates has been reached.</p> |
