发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF MANUFACTURING RESIN PATTERN, AND DISPLAY DEVICE
摘要 (Task) The present invention aims at providing a negative-type photosensitive resin composition having a forward taper-shape opening, a method of manufacturing resin patterns using the same, and a display unit having the resin pattern made by the same manufacturing method.(Solution) The photosensitive resin composition herein contains: (A) an alkali-soluble resin, (B) a photopolymerizable initiator, and (C) a photopolymerizable compound, and a monofunctional monomer having the glass transition temperature not higher than -10 °C when the photopolymerization compound is composed of homopolymers of 10000 or more mass-average molecular weight.
申请公布号 KR20150037532(A) 申请公布日期 2015.04.08
申请号 KR20140122549 申请日期 2014.09.16
申请人 도오꾜오까고오교 가부시끼가이샤 发明人 가타노 아키라;사이죠 히데키
分类号 G03F7/027;G03F7/032 主分类号 G03F7/027
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