| 摘要 |
<p>The present invention relates to a substrate treating apparatus. The substrate treating apparatus according to an embodiment of the present invention comprises a substrate supporting member supporting a substrate going to be treated; a rotating member rotating the substrate supporting member; a container provided to surround the boundary of the substrate supporting member; a treatment liquid supply unit located on one side of the substrate support member, and having a movable part in which a first nozzle and a second nozzle are located; and a standby part located on one side of the container, and having the upper surface in which the second nozzle separated from the treatment liquid supply unit is located formed to have a step.</p> |
