| 摘要 |
<p>Disclosed is a photosensitive siloxane composition having: (a) a polysiloxane synthesized by reacting at least one organosilane represented by general formula 1, (b) a quinone diazide compound, (c) a solvent, and (d) the silicate compound represented by general formula 2. (In formula 1, R1 represents any of hydrogen, an alkyl group having 1-10 carbon atoms, an alkenyl group having 2-10 carbon atoms, or an aryl group having 6-15 carbon atoms; the plurality of R1 may be the same or different. R2 represents any of hydrogen, an alkyl group having 1-6 carbon atoms, an acyl group having 2-6 carbon atoms, or an aryl group having 6-15 carbon atoms; the plurality of R2 may be the same or different; and n represents an integer from 0 to 3.) (In formula 2, R3 to R6 each independently represents any of hydrogen, an alkyl group having 1-6 carbon atoms, an acyl group having 2-6 carbon atoms; or an aryl group having 6-15 carbon atoms; and p represents an integer from 2 to 10.) Provided is the photosensitive siloxane composition that can yield a cured film having the properties of high heat resistance and high transparency, and of which the chemical resistance is favorable.</p> |
