| 摘要 |
<p>The object of the present invention is to provide a radiation-sensitive resin composition which is superior in terms of storage stability, inhibition of developing defect, LWR performance, CDU performance, resolution, rectangularity of a surface shape, focus depth, and MEEF performance. The present invention provides a radiation-sensitive resin composition which contains a compound having a structure represented by the following chemical formula (1): a first polymer containing a fluorine atom; and a solvent. In the following chemical formula (1), X represents a carbonyl group, a sulfonyl group or a single bond. Y^+ represents a monovalent radiation-degradable onium cation. The first polymer preferably has at least one selected from the group consisting of a structural unit represented by the following formula (2a) and a structural unit represented by the following formula (2b). The first polymer preferably includes an alkali-labile group. The first polymer preferably contains an acid-labile group. It is preferred that a radiation-sensitive acid generator is further contained.</p> |
