发明名称 Chemical vapour deposition of thin films using metal amidinate precursors
摘要 <p>The application discloses CVD of thin films employing amidinate complexes of the metals lithium, sodium, potassium, beryllium, calcium, strontium, barium, scandium, yttrium, lanthanum and the other lanthanide metals, titanium, zirconium, hafnium, vanadium, niobium, tantalum, molybdenum, tungsten, manganese, rhenium, iron, ruthenium, cobalt, rhodium, nickel, palladium, silver, Zinc, cadmium, tin, lead, antimony and bismuth as precursor. A novel cobalt precursor is also disclosed.</p>
申请公布号 EP2857549(A2) 申请公布日期 2015.04.08
申请号 EP20140195851 申请日期 2008.04.09
申请人 PRESIDENT AND FELLOWS OF HARVARD COLLEGE 发明人 GORDON, ROY GERALD;BHANDARI, HARISH B.;KIM, HOON
分类号 C23C16/18;C07C211/65;C23C16/04;C23C16/34;C23C16/455;H01L21/285;H01L21/768;H01L23/532 主分类号 C23C16/18
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