| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a cleaning agent of a multi-drug type semiconductor substrate that suppresses or prevents the damage of a gate insulator and a substrate, etc., can effectively remove impurity adhered to the surface of a semiconductor substrate, particularly, deposit such as resist on which ion implantation is performed, and has excellent safety, and to provide a cleaning method using the cleaning agent, and a manufacturing method of a semiconductor element. <P>SOLUTION: A multi-drug type cleaning agent uses the mixture of at least a first agent and a second agent in cleaning a semiconductor substrate as a cleaning agent of a semiconductor substrate. The first agent includes an amine compound, the second agent includes an oxidizer, and the multi-drug type cleaning agent further uses alkylene carbonate by combining the alkylene carbonate with the first agent and the second agent. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
