发明名称 PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING SAME, AND STRUCTURE
摘要 Provided are a photocurable resin composition in which curing shrinkage in photo-imprinting is suppressed, and a photocurable resin composition capable of producing by photo-imprinting a structure which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition for imprinting includes a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) has a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1: B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10.
申请公布号 EP2858093(A1) 申请公布日期 2015.04.08
申请号 EP20130793970 申请日期 2013.05.15
申请人 SOKEN CHEMICAL & ENGINEERING CO., LTD. 发明人 YAMADA, HIROKO;SUTO, YASUO;MIYAZAWA, YUKIHIRO
分类号 H01L21/027;B29C59/00;B29C59/02;B81C99/00;C08F2/50;C08F22/10;G03F7/00 主分类号 H01L21/027
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