发明名称 |
Non-uniform lateral profile of two-dimensional electron gas charge density in type III nitride HEMT devices using ion implantation through gray scale mask |
摘要 |
A high electron mobility field effect transistor (HEMT) includes a two dimensional electron gas (2DEG) in the drift region between the gate and the drain that has a non-uniform lateral 2DEG distribution that increases in a direction in the drift region from the gate to the drain. |
申请公布号 |
US9000484(B2) |
申请公布日期 |
2015.04.07 |
申请号 |
US201213478402 |
申请日期 |
2012.05.23 |
申请人 |
HRL Laboratories, LLC |
发明人 |
Khalil Sameh G.;Boutros Karim S. |
分类号 |
H01L29/66;H01L21/265;H01L29/34;H01L29/778;H01L29/20;H01L29/423 |
主分类号 |
H01L29/66 |
代理机构 |
Ladas & Parry |
代理人 |
Ladas & Parry |
主权项 |
1. A high electron mobility field effect transistor (HEMT) comprising:
lattice damage in a drift region of a carrier supply layer between a gate and a drain; wherein the lattice damage increases linearly along the drift region from near the drain to near the gate; and a two dimensional electron gas (2DEG) in the drift region between the gate and the drain that has a non-uniform lateral 2DEG distribution that increases in a direction in the drift region from the gate to the drain. |
地址 |
Malibu CA US |