发明名称 Non-uniform lateral profile of two-dimensional electron gas charge density in type III nitride HEMT devices using ion implantation through gray scale mask
摘要 A high electron mobility field effect transistor (HEMT) includes a two dimensional electron gas (2DEG) in the drift region between the gate and the drain that has a non-uniform lateral 2DEG distribution that increases in a direction in the drift region from the gate to the drain.
申请公布号 US9000484(B2) 申请公布日期 2015.04.07
申请号 US201213478402 申请日期 2012.05.23
申请人 HRL Laboratories, LLC 发明人 Khalil Sameh G.;Boutros Karim S.
分类号 H01L29/66;H01L21/265;H01L29/34;H01L29/778;H01L29/20;H01L29/423 主分类号 H01L29/66
代理机构 Ladas & Parry 代理人 Ladas & Parry
主权项 1. A high electron mobility field effect transistor (HEMT) comprising: lattice damage in a drift region of a carrier supply layer between a gate and a drain; wherein the lattice damage increases linearly along the drift region from near the drain to near the gate; and a two dimensional electron gas (2DEG) in the drift region between the gate and the drain that has a non-uniform lateral 2DEG distribution that increases in a direction in the drift region from the gate to the drain.
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