发明名称 |
Solid-state imaging apparatus |
摘要 |
The present invention relates to a solid-state imaging apparatus including a first substrate having a plurality of photoelectric conversion units and a second substrate having a plurality of readout circuits. The first substrate is provided with a plurality of first conductive patterns that are electrically separated from one another and the second substrate is provided with a plurality of second conductive patterns that are electrically separated from one another. The first conductive patterns each include a first partial pattern extending in a first direction. The second conductive patterns each include a partial pattern extending in a second direction different from the first direction. The first partial pattern has a length extending in the first direction longer than a length thereof in the second direction. |
申请公布号 |
US9000343(B2) |
申请公布日期 |
2015.04.07 |
申请号 |
US201113807002 |
申请日期 |
2011.06.23 |
申请人 |
Canon Kabushiki Kaisha |
发明人 |
Ichikawa Takeshi;Shimotsusa Mineo;Momma Genzo |
分类号 |
H01L27/146;H01L31/00 |
主分类号 |
H01L27/146 |
代理机构 |
Canon USA, Inc. IP Division |
代理人 |
Canon USA, Inc. IP Division |
主权项 |
1. A solid-state imaging apparatus including a first substrate on which a plurality of photoelectric conversion units are arranged and a second substrate on which a plurality of readout circuits to process or read a signal generated by each of the photoelectric conversion units are arranged, the solid-state imaging apparatus comprising:
a plurality of first conductive patterns which are arranged on the first substrate and electrically separated from one another; and
a plurality of second conductive patterns which are arranged on the second substrate and electrically separated from one another,wherein each of the plurality of first conductive patterns has a first electrical connection portion to be in contact with at least one of the second conductive pattern, and each of the plurality of second conductive patterns has a second electrical connection portion to be in contact with at least one of the first conductive patterns,wherein the first conductive pattern includes a first partial pattern that includes the first electrical connection portion and extends in a first direction, and the second conductive pattern includes a second partial pattern that includes the second electrical connection portion and extends in a second direction different from the first direction, andwherein the first partial pattern has a length extending in the first direction longer than a length thereof in the second direction. |
地址 |
Tokyo JP |