发明名称 Apparatus and method for plasma arc coating
摘要 A system for coating a side surface of a moving substrate. The system includes an array of plasma sources, a first plurality of orifices located upstream of the array and a second plurality of orifices located downstream of the array. A coating reagent is injected from each orifice into a plasma jet issuing from plasma source associated with that orifice. A controller modulates the flow of coating reagent and the flow flush gas to the orifices according to the contours of the substrate and to the position of the substrate relative to the array. An additional plasma array and set of orifices may be employed to coat the opposite side surface of the substrate.
申请公布号 US8997687(B2) 申请公布日期 2015.04.07
申请号 US200711966554 申请日期 2007.12.28
申请人 Exatec LLC 发明人 Gasworth Steven M.
分类号 C23C16/00;H05H1/24;C23C16/455;C23C16/513;C23C16/52;C23C16/54;H01J37/32;H05H1/42 主分类号 C23C16/00
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A coating system for coating a substrate having opposing first and second side surfaces, the system comprising: a plasma source configured to issue a plasma jet toward the first side surface of the substrate; an orifice located generally adjacent to the plasma source; a coating reagent source coupled to the orifice and configured to provide a coating reagent thereto; a flush gas source coupled to the orifice and configured to provide a flush gas thereto; a controller configured to cease the flow of coating reagent to the orifice while directing flush gas to the orifice; a flush gas valve positioned in line between the flush gas source and the orifice, the flush gas valve also being coupled to the controller; wherein the flush gas valve is a shut-off valve; and wherein the flow of coating reagent from the coating reagent source continues uninterrupted when reagent flow to the orifice is suspended.
地址 Wixom MI US