摘要 |
UV-photoprotective, topically applicable cosmetic/dermatological compositions contain:
(a) at least one silicon-containing s-triazine substituted with two aminobenzoate or aminobenzamide groups of specific formula (I),;and (b) at least one non-silicon-containing lipophilic 1,3,5-triazine compound UV-screening agent, such compositions having improved photoprotective effectiveness in the UV-B range and the 1,3,5-triazine compound(s) being improvedly soluble therein. |
主权项 |
1. A topically applicable, UV-photoprotective cosmetic/dermatological composition comprising:
(a) at least one silicon-containing s-triazine compound substituted with two aminobenzoate or aminobenzamide groups of formula (I) below or one of its tautomeric forms: in which: the radicals R, which may be identical or different, are each a linear or branched and optionally halogenated or unsaturated C1-C30 alkyl radical, a C6-C12 aryl radical, a C1-C10 alkoxy radical or the trimethylsilyloxy group; a=0 to 3; the group D is an s-triazine compound of formula (II) below: in which: X is —O— or —NR3—, in which R3 is hydrogen or a C1-C5 alkyl radical, R1 is a linear or branched and optionally unsaturated C1-C20 alkyl radical that may contain a silicon atom, a C5-C20 cycloalkyl radical optionally substituted with 1 to 3 linear or branched C1-C4 alkyl radicals, the —(CH2CHR4—O)mR5 group or the —CH2—CH(OH)—CH2—O—R6 group, R4 is hydrogen or methyl; with the proviso that the (C═O)XR1 group is in the ortho-, meta- or para-position with respect to the amino group, R5 is hydrogen or a C1-C8 alkyl radical, R6 is hydrogen or a C4-C8 alkyl radical, m is an integer ranging from 2 to 20, n=0 to 2, the radicals R2, which may be identical or different, are each a hydroxyl radical, a linear or branched C1-C8 alkyl radical, or a C1-C8 alkoxy radical, with the proviso that two adjacent radicals R2 of the same aromatic ring may together form an alkylidenedioxy group in which the alkylidene group contains 1 or 2 carbon atoms, A is a divalent radical selected from among methylene, —[CH(Si(CH3)3]—, ethylene or a group corresponding to one of the following formulae (III), (IV) and (V): in which:
Z is a linear or branched, saturated or unsaturated C1-C10 alkylene diradical optionally substituted with a hydroxyl radical or oxygen and that may optionally contain an amino group,W is a hydrogen atom, a hydroxyl radical or a linear or branched, saturated or unsaturated C1-C8 alkyl radical, (b) at least one non-silicon-containing lipophilic 1,3,5-triazine compound UV-screening agent, formulated into a topically applicable, cosmetically/dermatologically acceptable support therefor. |