| 主权项 |
1. A color processing apparatus comprising:
an obtaining section, configured to obtain, by using one or more processors, spectral reflectances of color patches formed on a medium, wherein the spectral reflectances of the color patches are measured under a condition in which light having an excitation wavelength is cut; a first inputting section, configured to input, by using one or more processors, bi-spectral radiance factors of the medium on which no color patch is formed, wherein the bi-spectral radiance factors represent spectral radiance factors of the medium in a predetermined wavelength range when monochromatic light is incident on the medium; and a computing section, configured to compute, by using one or more processors, bi-spectral radiance factors of the color patches formed on the medium based on the spectral reflectances of the color patches and the bi-spectral radiance factors of the medium, wherein the computing section extracts a spectral radiance of the medium when an incident wavelength is equal to a measurement wavelength from the bi-spectral radiance factors of the medium, computes spectral attenuations of color materials used to form the color patches based on the spectral radiance of the medium and the spectral reflectances of the color patches, and computes the bi-spectral radiance factors of the color patches based on the spectral attenuations of the color materials and the bi-spectral radiance factors of the medium. |
