发明名称 |
Developable bottom antireflective coating composition and pattern forming method using thereof |
摘要 |
The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels. |
申请公布号 |
US8999624(B2) |
申请公布日期 |
2015.04.07 |
申请号 |
US201213537177 |
申请日期 |
2012.06.29 |
申请人 |
International Business Machines Corporation |
发明人 |
Chen Kuang-Jung;Holmes Steven J.;Huang Wu-Song;Kwong Ranee;Liu Sen |
分类号 |
G03F7/11;G03F7/004;G03F7/039;H01L21/027;C08L33/06;C08F220/26;C08L33/16 |
主分类号 |
G03F7/11 |
代理机构 |
|
代理人 |
Kellner Steven M.;Cai Yuanmin;Li Wenjie |
主权项 |
1. A bottom antireflective coating (BARC) composition comprising:
a first polymer comprising a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety which absorbs light at a wavelength selected from a range from 100 nm to 400 nm; a second polymer comprising a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety which absorbs light at a wavelength selected from a range from 100 nm to 400 nm; a crosslinking agent joining the first polymer and the second polymer; and a radiation sensitive acid generator. |
地址 |
Armonk NY US |