Endpoint detector for a semiconductor processing station and associated methods

摘要

A semiconductor processing apparatus includes a semiconductor processing station for a semiconductor wafer, and an endpoint detector associated with the semiconductor processing station. The endpoint detector includes a non-contact probe configured to probe the semiconductor wafer, an optical transmitter configured to transmit an optical signal to the non-contact probe, and an optical receiver configured to receive a reflected optical signal from the non-contact probe. The controller controls the semiconductor processing station based on the reflected optical signal.

主权项

1. A semiconductor processing apparatus comprising:
a semiconductor processing station for a semiconductor wafer comprising a substrate and at least one layer thereon to be processed; and an endpoint detector associated with said semiconductor processing station and comprising
a non-contact probe configured to probe the semiconductor wafer,an optical transmitter configured to transmit an optical signal to said non-contact probe,an optical receiver configured to receive a reflected optical signal from said non-contact probe, anda controller configured to generate a surface potential profile of the at least one layer based on the reflected optical signal to control said semiconductor processing station.