| 摘要 |
<p>The present invention relates to a method for manufacturing an array substrate for a liquid crystal display, which comprises the steps of: a) forming a gate wiring on a substrate; b) forming a gate insulation layer on the substrate including the gate wiring; c) forming a semiconductor layer on the gate insulation layer; d) forming a source and drain electrode on the semiconductor layer; and e) forming a pixel electrode connected to the drain electrode, wherein the step a) or d) is characterized by forming copper-based metal film on the substrate or the semiconductor layer, and etching the copper-based metal film with an etchant composition to form the gate wiring or the source and drain electrode. The etchant composition is a copper-based metal film etchant composition containing 15-25 wt% of peroxide, and 0.3-5 wt% of phosphorus acid for total weight of the composition, and remaining of water for the total weight of the composition to be 100 wt%.</p> |
