Process for producing member having pattern, pattern transfer apparatus, and mold

摘要

A process of producing a member having a pattern. The process includes preparing a first mold having a pattern surface provided with a first uneven pattern at a surface of the first mold, and preparing a second mold having a pattern surface, provided with a second uneven pattern at a surface of the second mold, including a shape portion corresponding to an outer peripheral shape of the pattern surface provided with the first uneven pattern. When the pattern is transferred onto the member in a transfer area including (i) a peripheral area, which is an area not large enough to transfer an entire first uneven pattern of the first mold, and (ii) an area inside the peripheral area, in the area inside the peripheral area, the first uneven pattern of the first mold is transferred plural times to form a pattern group of the first uneven patterns, and in the peripheral area, the second uneven pattern of the second mold, including a shape portion corresponding to an outer peripheral shape of the pattern group, is transferred.

主权项

1. A patterning process comprising the steps of:
preparing a first mold having a first uneven pattern at a patterning surface thereof; preparing a second mold as a peripheral shot mold having a second uneven pattern at a patterning surface thereof; providing a wafer comprising a peripheral area along an entire peripheral edge thereof and having a non-peripheral area positioned inside the peripheral area and spaced from the peripheral edge; using the first mold to imprint a non-peripheral pattern group positioned completely within the non-peripheral area, the non-peripheral pattern group comprising a plurality of non-peripheral pattern units each corresponding to an individual imprint of the first mold; and using the second mold to imprint a peripheral pattern positioned completely within the peripheral area, the second mold and peripheral pattern each comprising a shape having straight line segments corresponding to and outlining corners of a plurality of the non-peripheral pattern units and each having a curved line corresponding to the peripheral edge of the wafer, wherein the peripheral area is not large enough to imprint an entire non-peripheral pattern unit.