| 摘要 |
<p>A substrate processing apparatus according to an embodiment includes: a chamber, a substrate support unit which is arranged in the chamber and supports a substrate, and a gas distribution unit which faces the substrate support unit. The gas distribution unit includes: a gas distribution part, a baffle plate which is arranged in the gate distribution part and has multiple holes, and an opening/closing plate which is arranged on a side of the baffle plate and selectively opens/close the holes. An embodiment has an opening/closing plate which opens/closes holes formed in a baffle plate, thereby controlling the aperture ratio of the holes formed in the baffle plate without new manufacture.</p> |
