发明名称 |
SUSCEPTOR WITH SUPPORTING ELEMENT |
摘要 |
<p>The present invention mainly relates to a susceptor for a reactor for epitaxial growth, comprising: a disc-shaped body (90) having a first face and a second face, wherein the first face comprises at least one zone (99) adapted to receive a substrate (2000) to be subjected to epitaxial growth and at least one supporting element (91+97) for the substrate (2000), located at the zone (99); the supporting element (91+97) comprises a circular disc (91) with an edge (97) which is raised with respect to the disc; the zone (99) may be a bottom of a recess (99) or a top of a relief of the disc-shaped body (90); the disc-shaped body (90) is solid at least at the recess (99) or relief.</p> |
申请公布号 |
WO2015044747(A1) |
申请公布日期 |
2015.04.02 |
申请号 |
WO2014IB01908 |
申请日期 |
2014.09.24 |
申请人 |
LPE S.P.A. |
发明人 |
COREA, FRANCESCO;CRIPPA, DANILO;GOBBO, LAURA;MAUCERI, MARCO;OGLIARI, VINCENZO;PRETI, FRANCO;PUGLISI, MARCO;VECCHIO, CARMELO |
分类号 |
C23C16/458;C30B25/12;H01L21/687 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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