发明名称 METHODS FOR PRODUCING IN-SITU GROOVES IN CHEMICAL MECHANICAL PLANARIZATION (CMP) PADS, AND NOVEL CMP PAD DESIGNS
摘要 Methods for producing in-situ grooves in CMP pads are provided. In general, the methods for producing in-situ grooves comprise the steps of patterning a silicone lining, placing the silicone lining in, or on, a mold, adding CMP pad material to the silicone lining, and allowing the CMP pad to solidify. CMP pads comprising novel groove designs are also described. For example, described here are CMP pads comprising concentric circular grooves and axially curved grooves, reverse logarithmic grooves, overlapping circular grooves, lassajous groves, double spiral grooves, and multiply overlapping axially curved grooves. The CMP pads may be made from polyurethane, and the grooves produced therein may be made by a method from the group consisting of silicone lining, laser writing, water jet cutting, 3-D printing, thermoforming, vacuum forming, micro-contact printing, hot stamping, and mixtures thereof.
申请公布号 US2015093977(A1) 申请公布日期 2015.04.02
申请号 US201414562589 申请日期 2014.12.05
申请人 Deopura Manish;Vaidya Hem M.;Roy Pradip K. 发明人 Deopura Manish;Vaidya Hem M.;Roy Pradip K.
分类号 B24B37/26 主分类号 B24B37/26
代理机构 代理人
主权项 1. A CMP pad comprising overlapping circular grooves.
地址 Cambridge MA US