| 发明名称 |
COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD |
| 摘要 |
A composition for pattern formation includes a block copolymer that includes a block represented by formula (I) and a block represented by formula (II). R1 and R3 each independently represent a hydrogen atom, a methyl group, a fluorine atom or a trifluoromethyl group. R2 represents a monovalent organic group. R4 represents a hydrocarbon group having a valency of (1+b) and having 1 to 5 carbon atoms. R5 represents a monovalent group having a hetero atom. m and n are each independently an integer of 10 to 5,000. a is an integer of 0 to 5. b is an integer of 1 to 3.; |
| 申请公布号 |
US2015093508(A1) |
申请公布日期 |
2015.04.02 |
| 申请号 |
US201414566841 |
申请日期 |
2014.12.11 |
| 申请人 |
JSR CORPORATION |
发明人 |
NAGAI Tomoki;Minegishi Shinya;Sone Takuo;Namie Yuji |
| 分类号 |
C09D153/00 |
主分类号 |
C09D153/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition for pattern formation comprising:
a block copolymer comprising a block represented by formula (I) and a block represented by formula (II): wherein, in the formulae (I) and (II), R1 and R3 each independently represent a hydrogen atom, a methyl group, a fluorine atom or a trifluoromethyl group; R2 represents a monovalent organic group; R4 represents a hydrocarbon group having a valency of (1+b) and having 1 to 5 carbon atoms; R5 represents a monovalent group having a hetero atom; m and n are each independently an integer of 10 to 5,000; a is an integer of 0 to 5; and b is an integer of 1 to 3, wherein in a case in which a and b are each 2 or greater, a plurality of R2s are each identical or different with each other, and a plurality of R5s are each identical or different with each other. |
| 地址 |
Tokyo JP |
