发明名称 RESISTIVE MEMORY APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 A resistive memory apparatus includes a first electrode formed on a semiconductor substrate, an insulating layer formed on the first electrode and including a hole exposing an upper surface of the first electrode, a data storage unit in which a first resistance-variable material and a second resistance-variable material are alternately formed in the hole at least once, and a second electrode formed on the data storage unit.
申请公布号 US2015090948(A1) 申请公布日期 2015.04.02
申请号 US201414150558 申请日期 2014.01.08
申请人 SK hynix Inc. 发明人 SON Min Seok
分类号 H01L45/00 主分类号 H01L45/00
代理机构 代理人
主权项 1. A resistive memory apparatus comprising: a first electrode formed on a semiconductor substrate; an insulating layer formed on the first electrode and including a hole exposing an upper surface of the first electrode; a data storage unit in which a first resistance-variable material and a second resistance-variable material having different resistances from each other are alternately formed at least once in the hole; and a second electrode formed on the data storage unit.
地址 Gyeonggi-do KR
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