METHOD FOR REMOVING PHOTORESIST, EXPOSURE APPARATUS AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE

摘要

A method for removing a photoresist, an exposure apparatus and a manufacturing method for a display substrate. The method for removing a photoresist comprises: conducting exposure processing on a photoresist (43) on a substrate (41) after it has been processed through a patterning process; and removing a photoresist (45), after the exposure processing, through developing processing. The method avoids the problem that a stripping device needs to be configured so as to conduct graying processing on the photoresist and a high-power device and a chemical gas need to be configured when performing stripping processing on the photoresist, thereby saving device costs and reducing production costs at the same time.