发明名称 X-RAY MASK STRUCTURE AND MANUFACTURING METHOD THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray mask structure and a manufacturing method therefor, having high accuracy and rigidity.SOLUTION: The X-ray mask structure includes: a support substrate 11 having at least one thin-formed part 21 integrally molded and surrounded by a wall part 25; an upper layer 15B which is disposed on the at least one thin-formed part 21 of the support substrate 11, and forms a laminate film 27 together with the at least one thin-formed part 21; and a plurality of X-ray absorption patterns 35 disposed on the upper layer 15B upward of the at least one thin-formed port 21. The at least one thin-formed part 21 and the wall part 25 provide the upper layer 15B with mechanical support, whereas the laminate film 27 provides the plurality of X-ray absorption patterns 35 with mechanical support.</p>
申请公布号 JP2015062212(A) 申请公布日期 2015.04.02
申请号 JP20140026518 申请日期 2014.02.14
申请人 NATINAL SYNCHROTRON RADIATION RESEARCH CENTER 发明人 SHEW BOR YUAN
分类号 H01L21/027;B81B1/00;B81C1/00;G03F1/22 主分类号 H01L21/027
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