发明名称 Silicon Dioxide Dispersion
摘要 The invention relates to a silicon dioxide dispersion that comprises a) an outer flowable phase containing 1) polymerizable monomers, oligomers and/or prepolymers that can be converted to polymers by non-radical reaction; and/or 2) polymers, and b) a disperse phase containing amorphous silicon dioxide. The inventive dispersion is characterized in that the average particle size dmax of the silicon dioxide as measured by small angle neutron scattering (SANS) is between 3 and 50 nm at a maximum half-width of the distribution curve of 1.5 dmax. Such a silicon dioxide dispersion can be easily manufactured even at higher concentrations of the disperse phase and can be used to produce polymer materials that have advantageous properties, especially advantageous mechanical properties.
申请公布号 US2015094386(A1) 申请公布日期 2015.04.02
申请号 US201414512017 申请日期 2014.10.10
申请人 EVONIK HANSE GMBH 发明人 ADAM Johannes;ROSCHER Christof;EGER Christian;ADEBAHR Thorsten;WIECZORRECK Robert;PYRLIK Manfred
分类号 C08K3/36;C08K7/18 主分类号 C08K3/36
代理机构 代理人
主权项 1. A silicon dioxide dispersion, comprising: a) an external phase comprising at least one of polymers and/or polymerizable constituents convertible to polymers by nonradical reactions, said polymerizable constituents selected from a group consisting of polymerizable monomers, oligomers and/or prepolymers, wherein said polymerizable constituents comprise polymerizable monomers that lack radically polymerizable double bonds and/or reactive resins; b) a disperse phase comprising amorphous silicon dioxide particles, wherein said disperse phase is from 20-80% by weight of said dispersion; wherein the average particle size dmax of said amorphous silicon dioxide particles as measured by small-angle neutron scattering (SANS) is between 3 and 50 nm and wherein the maximum half-width of the distribution curve is not more than 1.5 dmax; and wherein said dispersion is water-free.
地址 GEESTHACHT DE