发明名称 METHOD OF MANUFACTURING MICROLENS ARRAY SUBSTRATE, MICROLENS ARRAY SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC
摘要 There is provided a method of manufacturing a microlens array substrate with improved manufacturing yield and high quality, the method including: forming a groove part along an outer edge of a first area on a surface of a substrate; forming a mask layer to cover a side of the surface, forming a plurality of openings in the first area, and forming openings along the outer edge of the first area; performing isotropic etching on the substrate through the mask layer, forming a plurality of recesses in the first area, and forming recesses across a boundary part between the first area and the groove part; removing the mask layer from the substrate; forming a light transmission material layer that has a refractive index, which is different from a refractive index of the substrate, to cover the side of the surface of the substrate and to bury the plurality of recesses; and planarizing an upper surface of the light transmission material layer.
申请公布号 US2015092139(A1) 申请公布日期 2015.04.02
申请号 US201414480984 申请日期 2014.09.09
申请人 Seiko Epson Corporation 发明人 Eguchi Yoshikazu
分类号 G02B3/00;G03B21/00;G02F1/1335 主分类号 G02B3/00
代理机构 代理人
主权项 1. A method of manufacturing a microlens array substrate in which a plurality of microlenses are arranged in a first area, the method comprising: forming a groove part along an outer edge of the first area on a first surface of a substrate; forming a first mask layer to cover a side of the first surface of the substrate, forming a plurality of first openings corresponding to the plurality of microlenses in the first area of the first mask layer, and forming second openings along the outer edge of the first area; performing isotropic etching on the substrate through the first mask layer, forming a plurality of first recesses corresponding to the plurality of first openings in the first area, and forming second recesses corresponding to the second openings across an edge part on a side of the first area of the groove part; removing the first mask layer from the substrate; forming a light transmission material layer that has a refractive index, which is different from a refractive index of the substrate, to cover the side of the first surface of the substrate and to bury the plurality of first recesses and the second recesses; and planarizing an upper surface of the light transmission material layer.
地址 Tokyo JP