发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR SAME
摘要 In a semiconductor device (SP1) according to one embodiment, between a substrate layer (2CR) of a wiring board (2) and a semiconductor chip (3), a solder resist film (first insulating layer (SR1)) which adheres closely to the substrate layer, and a resin body (second insulating layer (4)) which adheres closely to the solder resist film and the semiconductor chip, are stacked. Furthermore, the linear expansion coefficient of the solder resist film is greater than or equal to the linear expansion coefficient of the substrate layer, the linear expansion coefficient of the solder resist film is less than or equal to the linear expansion coefficient of the resin body, and the linear expansion coefficient of the substrate layer is less than the linear expansion coefficient of the resin body. According to the configuration, it is possible to suppress damage to the semiconductor device caused by a temperature cycle load, and to improve reliability.
申请公布号 WO2015045089(A1) 申请公布日期 2015.04.02
申请号 WO2013JP76227 申请日期 2013.09.27
申请人 RENESAS ELECTRONICS CORPORATION 发明人 SHIMOTE, YOSHIKAZU;BABA, SHINJI;IWASAKI, TOSHIHIRO;NAKAGAWA, KAZUYUKI
分类号 H01L23/12;H05K3/28 主分类号 H01L23/12
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